Near-field exposure mask and pattern forming method

A pattern forming method for forming a pattern using a near-field exposure mask including:

• a first substrate;
• a concave-convex structure comprising convexities and concavities formed on one surface of the first substrate;
• and
• a near-field light generating film arranged at least on a tip portion of each of the convexities, the near-field light generating film being a layer comprising at least one element selected from the group consisting of Au, Al, Ag, Cu, Cr, Sb, W, Ni, In, Ge, Sn, Pb, Zn, Pd, and C, or a film stack formed with layers made of some of those materials,
• the method comprising:
• applying a light-curable resin onto a second substrate;
• positioning the near-field exposure mask so that the near-field light generating film arranged to the tip portion of each of the convexities is in contact with a surface of the light-curable resin applied onto the second substrate;
• emitting light from either a side of the first substrate or a side of the second substrate;
• and
• detaching the near-field exposure mask from the second substrate.