Adhesive composition, adhesive film including the same, method of preparing adhesive film, and display member using the same
AssigneeCheil Industries Inc.
InventorsIk Hwan Cho, In Cheon Han
Life of this patent
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Abstract
A UV curable adhesive composition includes a morpholine group-containing (meth)acrylic copolymer.
Drawings
Claims19
A UV curable adhesive composition, comprising a morpholine group-containing (meth)acrylic copolymer that is a copolymer of at least a C1 to C20 alkyl (meth)acrylate, an alicyclic (meth)acrylate, a hydroxyl group-containing monomer, and an unsaturated morpholine, wherein a weight ratio of the hydroxyl group-containing monomer to the unsaturated morpholine is about 1.5:1 to 15:1, wherein the adhesive composition has an acid value of 0, and further wherein a sample structure including an ITO film and an adhesive film formed by curing the adhesive composition attached to the ITO film has a resistance variation (ΔR) of less than about 5%, as defined by Equation 1:
- Δ
-
-
- R
- =
- P
- 2
- -
- P
- 1
- P
- 1
- ×
- 100
- ,
- [
- Equation
-
-
- 1
- ]
- where P2 is a resistance of the sample structure after storage at 60° C./90% RH for 240 hours and P1 is an initial resistance of the sample structure.
A method of preparing an adhesive film, the method comprising:
- preparing a morpholine group-containing (meth)acrylic copolymer by polymerizing a monomer mixture including a C1 to C20 alkyl (meth)acrylate, an alicyclic (meth)acrylate, a hydroxyl group-containing monomer, and an unsaturated morpholine, wherein a weight ratio of the hydroxyl group-containing monomer to the unsaturated morpholine is about 1.5:1 to 15:1;
- preparing an adhesive composition by mixing the morpholine group-containing (meth)acrylic copolymer with a cross-linking agent, wherein the adhesive composition has an acid value of 0;
- and
- UV-curing the adhesive composition,
- wherein a sample structure including an ITO film and an adhesive film formed by curing the adhesive composition attached to the ITO film has a resistance variation (ΔR) of less than about 5%, as defined by Equation 1:
- Δ
-
-
- R
- =
- P
- 2
- -
- P
- 1
- P
- 1
- ×
- 100
- ,
- [
- Equation
-
-
- 1
- ]
- where P2 is a resistance of the sample structure after storage at 60° C./90% RH for 240 hours and P1 is an initial resistance of the sample structure.
Dependencies are inferred from the claim text.