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AssigneesMitsubishi Polycrystaline Silicon America Corporation (MIPSA), Mitsubishi Materials Corporation
InventorsMatthias Colomb, Rick Deckbar, Wesley Teichmiller, Bryan Nettles
Estimating the term…
This invention is a heater used to heat the feed process gas from 450° C. to greater than about 600° C. for the fluidized bed reactor (FBR) used for conversion of silicon tetrachloride (STC) to trichlorosilane (TCS). The invention involves stacked heater element carbon plates. The design of the plates allow the plates to act as baffles which improve heat transfer to the feed gas. Also, the heat gradients across each plate is calculated to be approximately 100° C. which is much lower than the gradient seen by conventional vertical heater elements. The design of the present invention prevents electrical grounding. In the design, the elements are surrounded by graphite wrapped in carbon felt to prevent heat loss by radiation and conduction.
An apparatus for producing trichlorosilane comprising:
An apparatus for producing trichlorosilane comprising:
An apparatus for producing trichlorosilane comprising:
An apparatus for producing trichlorosilane comprising:
Dependencies are inferred from the claim text.
From the US filing history. Foreign family members aren’t listed.
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1. Field of the Invention
The present invention relates to an apparatus and method for producing trichlorosilane in which metallurgical grade silicon powder is reacted with hydrogen gas and silicon tetrachloride gas (STC) while being fluidized by the hydrogen gas and STC, thereby producing trichlorosilane.
2. Description of Related Art
FIG. 1 is a cross-sectional view of a heater element stack;
FIG. 2A is a plan view of a first heater element carbon plate A and FIG. 2B is a cross-sectional view of the first heater element carbon plate A taken along line 2B-2B;
FIG. 3A is a plan view of a second heater element carbon plate B and FIG. 3B is a cross-sectional view of the second heater element carbon plate B taken along line 3B-3B;
Hereinafter, an explanation will be made of an embodiment of the present invention with reference to the drawings.
An apparatus for producing trichlorosilane is provided with a reactor, raw material supply device for supplying metallurgical grade silicon powder (Me-Si) as a raw material to the reactor, a feed gas introduction device for introducing hydrogen gas and STC which reacts with the metallurgical grade silicon powder, and a gas discharge device for discharging the generated gas containing trichlorosilane.
The reactor is provided with a body formed substantially in a straight cylindrical shape along the vertical direction, a bottom connected to the lower end of the body, and a large diameter portion connected coaxially to the upper end of the body. In this embodiment, the body is formed with a substantially similar diameter to the bottom and the space therebetween is partitioned by a horizontal distributor plate. On the other hand, a tapered portion is formed at the upper part of the body, and the large diameter portion is integrally connected to the upper end of the tapered portion. The diameter of the tapered portion gradually increases in the upper direction thereof. Thus, the internal space of the body is communicatively connected to that of the large diameter portion.
With fluidised particles: heating and cooling the reactor
Feeding of the fluidising gas: the fluidising gas being a reactant
According to "fluidised-bed" technique: fluidisation grids
Halogenated silanes: tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
About 6 years 5 months of term left · ends 15 Mar 2033 (estimated)