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US 8,945,444 B2Granted
High throughput imprint based on contact line motion tracking control
AssigneesCanon Nanotechnologies, Inc., Molecular Imprints, Inc.
InventorsXiaoming Lu, Philip D. Schumaker
Life of this patent
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Abstract
Systems and methods for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
Claims12
A method for controlling contact transition and conformation between a template and substrate during imprinting of polymerizable material disposed on a surface of the substrate, the method comprising:
- providing a distance between the template and substrate;
- applying to the template a predetermined back pressure and predetermined force by a template chuck and imprint head respectively so as to gradually contact the template with the substrate and provide an advancing contact line therebetween;
- using a controller to process an image of the contact line and determine a height profile and velocity of the contact line, the height profile defined by a varying distance in the form of curvature of a template region adjacent to but not contacting the substrate;
- based on the determined height profile and contact line velocity, providing an output signal from the controller having an adjusted back pressure and adjusted force;
- and
- applying the adjusted back pressure and adjusted force to the template by the template chuck and imprint head respectively so as to provide an adjusted contact line velocity and adjusted height profile.
3 more elements
Dependencies are inferred from the claim text.