Material test structure
AssigneeMicron Technology, Inc.
InventorsFabio Pellizzer, Innocenzo Tortorelli, Christina Papagianni, Gianpaolo Spadini, Jong Won Lee
Life of this patent
Estimating the term…
Abstract
Material test structures having cantilever portions and methods of forming the same are described herein. As an example, a method of forming a material test structure includes forming a number of electrode portions in a first dielectric material, forming a second dielectric material on the first dielectric material, wherein the second dielectric material includes a first cantilever portion and a second cantilever portion, and forming a test material on the number of electrode portions, the first dielectric material, and the second dielectric material.
Claims17
A method of forming a material test structure, the method comprising:
- forming a number of electrode portions in a first dielectric material;
- forming a second dielectric material on the first dielectric material, wherein the second dielectric material includes a first cantilever portion and a second cantilever portion;
- and
- forming a first portion of a test material on the number of electrode portions, a second portion of the test material on the first dielectric material, and a third portion of the test material on the second dielectric material, wherein the first, second, and third portions of the test material are noncontiguous.
A method of forming a number of material test structures, the method comprising:
- forming a number of electrode portions in one of a number of dielectric materials and planarizing a surface of the number of electrode portions;
- forming a number of openings by removing a number of portions of the number of dielectric materials, wherein forming the number of openings separates the number of material test structures from each other and wherein removing the number of portions of the number of dielectric materials forms a number of cantilever portions in the number of dielectric materials;
- and
- forming a number of noncontiguous test material portions on the number of cantilever portions and the number of electrode portions;
- and
- forming an electrode material on the test material.
A method of forming a material test structure, the method comprising:
- forming a conductive plug in a number of dielectric materials, the plug coupling an electrode to a select device formed in a substrate;
- performing a selective etch to remove a number of portions of the number of dielectric materials such that a number of cantilever portions are formed;
- forming a number of noncontiguous test material portions on the number of cantilever portions and the electrode.
Dependencies are inferred from the claim text.