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US 8,944,886 B2Granted
Abrasive slurry and dressing bar for embedding abrasive particles into substrates
AssigneeRDC Holdings, LLC
InventorsKarl G. Schwappach, Zine-Eddine Boutaghou
Life of this patent
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Abstract
An abrasive polishing slurry including abrasive particles in a carrier fluid and micro-nano members. A system and method for making an abrasive article using the polishing slurry is also disclosed. The system includes a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the members set a height the embedded abrasive particles protrude above the substrate.
Claims16
A system for making an abrasive article comprising:
- abrasive particles in a carrier fluid;
- micro-nano scale members;
- a substrate;
- and
- a gimballed dressing bar adapted to provide a compressive force sufficient to embed the abrasive particles into the substrate, wherein the micro-nano scale members set a height the embedded abrasive particles protrude above the substrate.
2 more elements
A method of making an abrasive article comprising the steps of:
- locating a slurry of abrasive particles, micro-nano members, and a carrier fluid between a substrate and a gimballed dressing bar;
- and
- engaging the gimballed dressing bar with the slurry with sufficient force to embed the abrasive particles into the substrate until the abrasive particles protrude above the substrate a substantially uniform height corresponding to the thickness of the micro-nano scale members.
Dependencies are inferred from the claim text.