Liquid processing apparatus and liquid processing method
AssigneeTokyo Electron Limited
InventorJiro Higashijima
Life of this patent
Estimating the term…
Abstract
Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a cup. The liquid processing apparatus includes: a processing chamber in which a substrate holding unit holding a substrate and a cup placed around the substrate holding unit are installed; a nozzle for supplying a processing liquid to the substrate held by the substrate holding unit; and a cup cleaning unit cleaning the cup by supplying a cleaning liquid to the upper part of the cup. A concave portion is formed in the upper part of the cup and the cup cleaning units supply the cleaning liquid to the concave portion in the upper part of the cup.
Claims8
A liquid processing apparatus, comprising:
- a processing chamber in which a substrate holding unit configured to hold a substrate and a cup placed around the substrate holding unit are installed;
- a guide cup provided at a lower side of the cup including a processing liquid recovering tank attached at a bottom portion thereof such that a processing liquid laterally scattered from the substrate is guided by the guide cup to be collected at the processing liquid recovering tank;
- a nozzle configured to supply a processing liquid to the substrate held by the substrate holding unit;
- and
- a cup cleaning unit configured to clean the cup by supplying a cleaning liquid to an upper part of the cup,
- wherein a concave portion is formed along an outside surface of the upper part of the cup located above the guide cup such that the concave portion of the cup is disposed entirely above the guide cup and the processing liquid recovering tank, and the cup cleaning unit supplies the cleaning liquid to the concave portion in the upper part of the cup.
Dependencies are inferred from the claim text.