Single-body electrostatic chuck
AssigneeApplied Materials, Inc.
InventorsSenh Thach, Dmitry Lubomirsky, Jennifer Y. Sun, Konstantin Makhratchev
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Abstract
An electrostatic chuck includes a thermally conductive base having a plurality of heating elements disposed therein. A metal layer covers at least a portion of the thermally conductive base, wherein the metal layer shields the plurality of heating elements from radio frequency (RF) coupling and functions as an electrode for the electrostatic chuck. A plasma resistant dielectric layer covers the metal layer.
Claims20
An electrostatic chuck comprising:
- a thermally conductive base;
- a plurality of heating elements in the thermally conductive base, wherein the plurality of heating elements comprises a plurality of primary heating elements embedded in the thermally conductive base and a plurality of auxiliary heating elements disposed in recesses formed in an upper surface of the thermally conductive base;
- a metal layer covering at least a portion of the thermally conductive base;
- and
- a plasma resistant dielectric layer covering the metal layer.
A method of manufacturing an electrostatic chuck comprising:
- providing a thermally conductive base;
- forming a plurality of recesses in an upper surface of the thermally conductive base;
- forming a plurality of auxiliary heating elements in the plurality of recesses;
- filling the plurality of recesses with a dielectric material;
- depositing a metal layer over the upper surface of the thermally conductive base;
- and
- covering the metal layer with a plasma resistant dielectric layer.
An electrostatic chuck having been manufactured by a manufacturing process comprising:
- providing a thermally conductive base;
- forming a plurality of recesses in an upper surface of the thermally conductive base;
- forming a plurality of auxiliary heating elements in the plurality of recesses;
- filling the plurality of recesses with a dielectric material;
- depositing a metal layer over the upper surface of the thermally conductive base;
- and
- covering the metal layer with a plasma resistant dielectric layer.
Dependencies are inferred from the claim text.