Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsRaymond Wilhelmus Louis Lafarre, Jozef Petrus Henricus Benschop, Nicolaas Ten Kate, Niek Jacobus Johannes Roset, Gerardus Adrianus Antonius Maria Kusters, Alexander Nikolov Zdravkov, Hrishikesh Patel, Sander Van Opstal
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Abstract
A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
Claims21
A substrate table for a lithographic apparatus, the substrate table comprising:
- a substrate table part having a substantially planar upper surface in which there is a recess that is configured to receive a substrate, the recess having a cross-sectional width;
- a cover, configured such that, in use, it extends around the substrate from the upper surface of the substrate table part to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate and such that it defines an open central section of the cover, wherein the cover has a cross-sectional width larger than the cross-sectional width of the recess;
- and
- an actuator system, in or on the substrate table, configured to move the cover between a closed position, in which the cover is in contact with the upper surface of a substrate supported in the recess and in contact with and on top of the upper surface of the substrate table part and the open central section is smaller than the upper surface of the substrate, and an open position, in which the cover is displaced vertically from and above a substrate in the recess and displaced vertically from and above the upper surface of the substrate table part, wherein the actuator system is configured such that, in moving the cover to the open position, at least part of the actuator system moves between the substrate supported in the recess and at least part of the upper surface of the substrate table part and the actuator system enlarges the open central section of the cover sufficiently for the substrate to be able to pass through the open central section of the cover.
A substrate table for a lithographic apparatus, the substrate table configured to support a substrate in a recess, the substrate table comprising:
- a substrate table part having a substantially planar upper surface in which there is the recess, the recess dimensioned to have a gap between a substrate supported by the substrate table and an edge of the recess, the recess having a cross-sectional width;
- a closing element shaped and dimensioned to close the gap between an edge of a substrate and the edge of the recess, the closing element having a cross-sectional width larger than the cross-sectional width of the recess;
- and
- an actuator, in or on the substrate table, configured to move the closing element between an open position in which a substrate can be placed in the recess and a closed position in which the closing element closes the gap, wherein, in moving the closing element between the open and closed position, at least part of the actuator moves between the substrate supported in the recess and at least part of the upper surface of the substrate table part,
- wherein in moving the closing element into or out of the closed position, the actuator is configured to move the closing element in a direction substantially only perpendicular to the surface of the substrate when the closing element contacts the edge of the substrate and on top of the planar surface of the substrate table, to close or open the gap.
A method of loading a substrate onto, or unloading a substrate from, a substrate table of a lithographic apparatus, the substrate table, comprising a substrate table part having a substantially planar upper surface and a recess within the upper surface that is configured to receive the substrate, the recess having a cross-sectional width, the method comprising:
- using an actuator system, moving a cover between a closed position, in which the cover is in contact with the upper surface of the substrate supported in the recess and in contact with and on top of the upper surface of the substrate table part and the open central section is smaller than the upper surface of the substrate, the cover configured such that it extends around the substrate from the upper surface of the substrate table part to a peripheral section of the upper surface of the substrate, the cover defining an open central portion and the cover having a cross-sectional width larger than the cross-sectional width of the recess, and an open position, in which the cover is displaced vertically set apart from and above the substrate in the recess and displaced vertically from and above the upper surface of the substrate table part,
- wherein, in moving the cover to the open position, at least part of the actuator system moves between the substrate supported in the recess and at least part of the upper surface of the substrate table part and the open central section of the cover is enlarged sufficiently for the substrate to pass through the open central section of the cover.
A method of loading a substrate onto, or unloading a substrate from, a substrate table of a lithographic apparatus, the substrate table having a substantially planar upper surface in which there is recess to receive and support a substrate, the method comprising:
- moving a cover:
- between a closed position, in which the cover is in contact with and on top of an upper surface of a substrate supported in the recess and in contact with and on top of the upper surface of the substrate table, the cover configured such that it extends from the upper surface of the substrate table to a peripheral section of an upper major face of the substrate;
- and
- an open position, in which the cover is set apart from the substrate and from the upper surface of the substrate table, by moving at least part of an actuator for the cover through an opening in the upper surface of the substrate table, wherein at least part of the upper surface of the substrate table is located between the substrate supported in the recess and the opening;
- and
- removing the substrate from, or placing the substrate on, the substrate table.
A substrate table for a lithographic apparatus, the substrate table having a substantially planar upper surface in which is formed a recess that is configured to receive and support a substrate, the substrate table comprising:
- a cover, configured such that, in use, it extends from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate;
- and
- an actuator system, in or on the substrate table, configured to move the cover between a closed position, in which the cover is in contact with the upper surface of a substrate supported in the recess and in contact with and on top of the upper surface of the substrate table, and an open position, in which the cover is set apart from a substrate in the recess and from the upper surface of the substrate table, wherein at least part of the upper surface of the substrate table is located between the substrate supported in the recess and an opening in the upper surface of the substrate table through which at least part of the actuator system moves.
Dependencies are inferred from the claim text.