Evaluation method, adjustment method, exposure apparatus, and memory medium
AssigneeCanon Kabushiki Kaisha
InventorTadashi Arai
Life of this patent
Estimating the term…
Loading patent…
AssigneeCanon Kabushiki Kaisha
InventorTadashi Arai
Estimating the term…
A method evaluating an imaging performance of a projection optical system according to a polarization state of light in a pupil of an illumination optical system for an exposure apparatus, comprises a representation step of numerically representing the polarization state in the pupil of the illumination optical system, an assumption step of virtually dividing the pupil of the illumination optical system into a plurality of partial regions, each of which includes a light incident region and a light non-incident region, and assuming individual polarization states for the plurality of partial regions so that one polarization state is assumed for the whole of each partial region based on the polarization state numerically represented in the representation step; and a calculation step of calculating the imaging performance of the projection optical system under a condition in which the plurality of partial regions have the polarization states individually assumed in the assumption step.
A method of evaluating an aberration of a projection optical system for an exposure apparatus which illuminates an original by an illumination optical system and projects a pattern of the original onto a substrate by the projection optical system, the method comprising:
An exposure apparatus comprising:
A non-transitory memory medium storing a computer program for making a computer execute a process for evaluating aberration of a projection optical system for an exposure apparatus which illuminates an original by an illumination optical system and projects a pattern of the original onto a substrate by the projection optical system, the process comprising:
Dependencies are inferred from the claim text.