Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKoen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Claims26
An apparatus, comprising:
- a substrate table arranged to hold a substrate during exposure in an immersion lithographic apparatus;
- a cover plate, physically separate from the substrate table, positioned outward of the substrate during exposure, the cover plate configured to provide a surface, facing a projection system of the immersion lithographic apparatus, that is substantially adjacent to the substrate;
- and
- a plurality of burls arranged between the substrate table and the cover plate.
A device manufacturing method, comprising:
- projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table;
- and
- supporting a cover plate, physically separate from the substrate table, on the substrate table at a position outward of the substrate during exposure using a plurality of protrusions arranged between the substrate table and the cover plate, the cover plate providing a surface that is substantially adjacent to a surface of the substrate onto which the modulated radiation beam is incident.
An apparatus, comprising:
- a substrate table to hold a substrate;
- a projection system to project a modulated radiation beam onto the substrate;
- a liquid supply system to provide a liquid in a region between the projection system and the substrate table during exposure;
- and
- a cover plate physically separate and removable from the substrate table, the cover plate positioned outward of the substrate during exposure and providing a surface facing the projection system that is adjacent to the substrate when supported by the substrate table, and the cover plate, the substrate table, or both, has a structure creating a void between the cover plate and the substrate table, the structure comprising a plurality of protrusions arranged between the substrate table and the cover plate.
Dependencies are inferred from the claim text.