Semiconductor device and method of manufacturing the same

A semiconductor device comprising:

• a base substrate made of silicon, the base substrate having a plurality of base semiconductor regions in a predetermined portion of a surface layer thereof, the plurality of base semiconductor regions being insulated and separated from each other;
• a cap substrate bonded to the predetermined portion of the surface layer of the base substrate;
• and
• a leading electrode including a metal part, the leading electrode passing through the cap substrate, the leading electrode having a first end connected to one of the plurality of base semiconductor regions of the base substrate and a second end located adjacent to a surface of the cap substrate for allowing an electrical connection with an external part, the surface being opposite to a bonding surface at which the base substrate and the cap substrate are bonded, wherein the leading electrode defines a groove between an outer surface thereof and the cap substrate, wherein
• the cap substrate is made of silicon,
• the cap substrate has a plurality of partial regions insulated and separated from each other,
• the leading electrode is constructed of the metal part and one of the plurality of partial regions,
• the metal part is disposed to cover a side surface and an end surface of the one of the plurality of partial regions, the end surface being adjacent to the second end of the leading electrode, and
• the groove is provided by an empty or unfilled space defined between an outer surface of the metal part, which covers the side surface of the one of the plurality of partial regions, and the cap substrate which is disposed on a periphery of the leading electrode.