Substrate processing apparatus, focus ring heating method, and substrate processing method

A substrate processing apparatus comprising:

• a housing chamber that houses a substrate;
• a mounting stage disposed in said housing chamber, for mounting the substrate thereon;
• an annular focus ring mounted on said mounting stage in such a manner as to surround a peripheral portion of the mounted substrate, said annular focus ring and said substrate separating from each other;
• and
• a magnetic field line generating device disposed on said mounting stage, said magnetic field line generating device being interposed between said mounting stage and said annular focus ring,
• wherein said magnetic field line generating device comprises an annular coil, an entire surface of said annular coil being covered by a heat insulation/electrical insulation material,
• wherein said annular focus ring has an annular plate-shaped induction heating unit which is disposed inside said annular focus ring, an entire surface of said induction heating unit being covered by said annular focus ring,
• wherein said magnetic field line generating device faces said induction heating unit,
• wherein said focus ring, said induction heating unit and said annular coil are disposed such that respective central axes of said annular focus ring, said induction heating unit and said annular coil are coincident with each other,
• wherein pressure in said housing chamber is reduced, radio frequency electrical power is applied to said mounting stage, and said annular focus ring generates heat by itself, and
• wherein said magnetic field line generating device generates magnetic field lines, and the magnetic field lines intersect said annular focus ring.