Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film

A pattern forming method comprising:

• (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition that contains a resin (A) and a compound (B) which has a polymerizable group and generates an acid by being irradiated with actinic rays or radiations;
• (2) exposing the film;
• and
• (3) developing the exposed film using a developer that contains an organic solvent,
• wherein a pattern formed in the method is a negative pattern,
• the compound (B) includes a non-nucleophilic anion,
• the anion has the polymerizable group, and
• the content of the organic solvent in the developer that contains the organic solvent is 90% by mass to 100% by mass based on the total amount of the developer.

A pattern forming method comprising:

• (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition that contains a resin (A) and a compound (B) which has a polymerizable group and generates an acid by being irradiated with actinic rays or radiations;
• (2) exposing the film;
• and
• (3) developing the exposed film using a developer that contains an organic solvent,
• wherein a pattern formed in the method is a negative pattern, and
• the polymerizable group of the compound (B) is an epoxy group, an oxetane group, or a group represented by the following General Formula (ZII),
• wherein in the General Formula (ZII), X represents an oxygen atom, a nitrogen atom, or an aromatic group having a valency of (n+2), and each of Ra and Rb independently represents a hydrogen atom or a monovalent organic group,
• n represents an integer of 0 to 6,
• in a case that X is an oxygen atom, n is 0, in a case that X is a nitrogen atom, n is 1, and in a case that X is an aromatic group having a valency of (n+2), n is an integer of 0 to 6,
• * represents a direct link, and
• the resin (A) is a resin which increases the polarity by the action of an acid to decrease the solubility in a developer containing an organic solvent.