Coating compositions suitable for use with an overcoated photoresist
OwnerJames F. Cameron, Jin Wuk Sung +3inventors
InventorsJames F. Cameron, Jin Wuk Sung, John P. Amara, Greogory P. Prokopowicz, David A. Valeri
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Abstract
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Claims14
A coated substrate comprising:
- (a) a coating composition layer comprising a resin, the resin comprising a reaction product of a diene and a dienophile, and wherein the coating composition layer is not crosslinked;
- and
- (b) a photoresist layer over the coating composition layer.
A coated substrate comprising:
- (a) a coating composition layer comprising a resin, the resin comprising a Diels Alder reaction product, and wherein the coating composition layer is not crosslinked;
- and
- (b) a photoresist layer over the coating composition layer.
A method for forming a photoresist relief image comprising:
- (a) applying over a substrate a coating layer of a composition comprising a resin, the resin comprising a reaction product of a diene and a dienophile;
- (b) without crosslinking the coating composition layer, applying a photoresist layer above the coating composition layer.
A method for forming a photoresist relief image comprising:
- (a) applying over a substrate a coating layer of a composition comprising a resin, the resin comprising a Diels Alder reaction product;
- (b) without crosslinking the coating composition layer, applying a photoresist layer above the coating composition layer.
A coated substrate comprising:
- (a) a coating composition layer comprising a resin, wherein the resin comprises a Diels-Alder reaction product of:
- 1) an imide-containing dienophile and a polycyclic aromatic group, or
- 2) i) a dienophile and ii) an anthracene or pentacene group;
- and
- (b) a photoresist layer over the coating composition layer.
A method for forming a photoresist relief image comprising:
- (a) applying over a substrate a coating layer of a composition comprising a resin, wherein the resin comprises a Diels-Alder reaction product of:
- 1) an imide-containing dienophile and a polycyclic aromatic group, or
- 2) i) a dienophile and ii) an anthracene or pentacene group;
- (b) applying a photoresist layer above the coating composition layer.
Dependencies are inferred from the claim text.