Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

An actinic-ray- or radiation-sensitive resin composition comprising:

• a compound (AI) having a feature (1) below;
• and
• a resin (B) having a feature (2) below;
• or a resin (C) and an acid crosslinking agent (D) having a feature (3) below,
• wherein
• (1) the compound (AI) is represented by general formula (II′-1), and when exposed to actinic rays or radiation, generates any of acids of general formula (I) below,
• (2) the resin (B), when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer,
• (3) the resin (C) soluble in an alkali developer and the acid crosslinking agent (D) is capable of crosslinking with the resin (C),
• in which
• W1 represents an optionally substituted alkylene group,
• W2 represents a bivalent connecting group,
• W3 represents an optionally substituted organic group having 15 or more carbon atoms, and
• Z represents or a fluoroalkylsulfonamido group having at least one fluorine atom introduced therein as a substituent,
• in which
• R represents an alkyl group substituted with at least one fluorine atom,
• each of Rf's independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom, and x is an integer of 1 or greater,
• G represents a single bond, an alkylene group optionally containing an ether oxygen, a cycloalkylene group optionally containing an ether oxygen, an arylene group or a group composed of a combination of these, provided that combined groups may be linked to each other through an oxygen atom,
• Ar represents an aromatic ring optionally containing a heteroatom, in which a substituent other than -(A-B) groups may further be introduced,
• A represents a single bond or a bivalent connecting group, B represents a hydrocarbon group, and n is an integer of 1 or greater,
• L represents a bivalent connecting group, and y is an integer of 0 or greater, provided that -(L)y- does not represent —SO2—O—,
• provided that when x is 2 or greater, two or more Rf—C—Rf's may be identical to or different from each other, and that when y is 2 or greater, two or more L's may be identical to or different from each other, and that when n is 2 or greater, two or more A-B's may each be identical to or different from each other, and
• M+ represents an organic onium ion of general formulae (ZI) or (ZII) below,
• in which,
• each of R201, R202 and R203 independently represents an organic group, and
• each of R204 and R205 independently represents an aryl group, an alkyl group or a cycloalkyl group.

A method of forming a pattern, comprising forming the actinic-ray- or radiation-sensitive resin composition into a film, exposing the film and developing the exposed film, wherein the exposure is performed using X-rays, electron beams or EUV, and wherein the resin composition comprises:

• a compound (AI) having a feature (1) below;
• and
• a resin (B) having a feature (2) below;
• or a resin (C) and an acid crosslinking agent (D) having a feature (3) below,
• wherein
• (1) the compound (AI) is represented by general formula (II-1) or (II′-1), and when exposed to actinic rays or radiation, generates any of acids of general formula (I) below,
• (2) the resin (B), when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer,
• (3) the resin (C) is soluble in an alkali developer and the acid crosslinking agent (D) is capable of crosslinking with the resin (C),
• in which
• W1 represents an optionally substituted alkylene group,
• W2 represents a bivalent connecting group,
• W3 represents an optionally substituted organic group having 15 or more carbon atoms, and
• Z represents a hydroxyl group or a fluoroalkylsulfonamido group having at least one fluorine atom introduced therein as a substituent,
• in which
• R represents an alkyl group substituted with at least one fluorine atom,
• each of Rf's independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom, and x is an integer of 1 or greater,
• G represents a single bond, an alkylene group optionally containing an ether oxygen, a cycloalkylene group optionally containing an ether oxygen, an arylene group or a group composed of a combination of these, provided that combined groups may be linked to each other through an oxygen atom,
• Ar represents an aromatic ring containing no heteroatom, in which a substituent other than -(A-B) groups may further be introduced,
• A represents a single bond or a bivalent connecting group, B represents a noncyclic hydrocarbon group containing a tertiary or quaternary carbon atom, or a cycloaliphatic hydrocarbon group having 3 to 30 carbon atoms, wherein said tertiary or quaternary carbon atom is selected from an isopropyl group, a t-butyl group, a t-pentyl group, a neopentyl group, an s-butyl group, an iso-butyl group, an isohexyl group, a 3,3-dimethylpentyl group and a 2-ethylhexyl group, and n is an integer of 1 or greater,
• L represents —S(═O)2—, and y is 1,
• provided that when x is 2 or greater, two or more Rf—C—Rf's may be identical to or different from each other, and that when n is 2 or greater, two or more A-B's may each be identical to or different from each other, and
• M+ represents an organic onium ion of general formulae (ZI) or (ZII) below,
• in which,
• each of R201, R202 and R203 independently represents an organic group, and
• each of R204 and R205 independently represents an aryl group, an alkyl group or a cycloalkyl group.