Vapor deposition apparatus and vapor deposition method
AssigneeSamsung Display Co., Ltd.
InventorsChoel-Min Jang, Myung-Soo Huh, Jeong-Ho Yi, Cheol-Rae Jo, Sang-Joon Seo, Seung-Hun Kim, Jin-Kwang Kim
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Abstract
A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.
Claims12
A vapor deposition method, comprising the steps of:
- disposing a heater unit, including a first heater and a second heater spaced apart from each other, at a side of a stage;
- moving the first heater and the second heater so that the first heater and the second heater are disposed adjacent to each other, after mounting a substrate on the stage;
- and
- depositing a thin film having a desired thickness on the substrate by injecting a gas through a nozzle unit, disposed at a side of the stage opposite to the side of the stage at which the heater unit is disposed, about the stage, the nozzle unit including at least one nozzle.
Dependencies are inferred from the claim text.