Vertical heat treatment apparatus
AssigneeTokyo Electron Limited
InventorKazuhide Hasebe
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AssigneeTokyo Electron Limited
InventorKazuhide Hasebe
Estimating the term…
Provided is a vertical heat treatment apparatus which performs a film-forming process for substrates by supplying a film-forming gas to a plurality of substrates loaded onto a substrate supporter. The substrate supporter is rotated around an inclination axis, and the apparatus includes: a plurality of main holders which are provided at every reception position of the substrates in the substrate supporter and respectively supports the peripheries of the substrates at positions separated from each other in the circumferential direction; and first and second auxiliary holders which are located to be separated from the main holders in the circumferential direction and whose tops are lower than those of the main holders. Each substrate alternates between a position supported by the first auxiliary holder and the main holders and a position supported by the second auxiliary holder and the main holders every rotation of the substrate supporter.
A vertical heat treatment apparatus which carries a substrate supporter supporting a plurality of substrates in the form of a shelf via supporting columns into a vertical reaction tube having a heater arranged around the vertical reaction tube and performs a film forming process for the substrates, comprising:
Dependencies are inferred from the claim text.