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US 8,936,744 B2Granted
Photocurable resin composition containing fluorine and method for producing a resin mold using same
AssigneeDongjin Semichem Co., Ltd.
InventorsJae-won Yoo, Byung-uk Kim, Un-yong Kim, Eun-jin Kwak
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Abstract
There are provided a fluorine-containing photocurable resin composition and a method of preparing a mold comprising the same and more particularly, a photocurable resin composition having chemical resistance, mechanical properties and high transmittance, etc. as well as being easily wetted with and released from thermosetting or photocurable resins for pattern formation regardless of additional surface treatment, as opposed to the existing polymer resin materials used for resin molds, and a method of preparing a resin mold using the same.
Claims4
A method of preparing a polymer resin mold, comprising:
- S1) applying a fluorine-containing photocurable resin solution to one side of a mold die with a pattern formed thereon and curing it to transfer the pattern of the mold die;
- and
- S2) releasing the cured polymer resin with the pattern transferred thereto from the mold die;
- S3a) forming a plasma-treated surface on the back side of the cured polymer resin with the released pattern formed thereon;
- S4a) forming a back-supporting body on the plasma-treated surface which is formed on the back side of the cured polymer resin;
- and
- S5a) adhering or curing the cured polymer resin with the back-supporting body formed thereon to prepare a polymer resin mold,
- wherein the photocurable resin composition comprises:
- a) 100 parts by weight of a reactive pre-polymer prepared by polymerizing
- i) a reactive fluorine-containing compound having a functional group;
- and
- ii) a reactive silicon-modified urethane compound having a functional group;
- b) 5 to 100 parts by weight of at least one compound selected from the group consisting of i) an olefin-type unsaturated compound;
- ii) an unsaturated compound containing an epoxy group;
- and
- iii) a silicon-type compound containing an epoxy group, amine group or fluorine group;
- and
- c) 0.1 to 10 parts by weight of a photo initiator,
- wherein a) i) the reactive fluorine-containing compound having a functional group is at least one selected from the group consisting of 6-perfluorohexanol, 3-perfluorobutylpropanol, 2-perfluoropropyltetrafluoropropanol, 2,5-ditrifluoromethyldioxaundecafluorononanol, octafluorohexanediol, perfluorobutylepoxypropane, perfluoromethylbutylepoxypropane, tetrafluoropropoxyepoxypropane, 1,4-bisepoxypropylperfluoro-n-butane, perfluorohexylethylene, 1-methoxyperfluoromethylpropane, 1,4-divinyldodecafluorohexane, 3-perfluorobutylhydroxypropylmethacrylate, 3-perfluorohexylhydroxylpropylmethacrylate, trifluoroethylmethacrylate, tetrafluoropropylmethacrylate, 2-perfluorohexylethylacrylate, 3-perfluoromethylbutyl-2-hydroxypropylacrylate, methyltrifluoroacetate, ethyltrifluoroacetate, trifluoroethylmethylether, tetrafluoroethylmethylether, hectafluorobutylamine, tridecafluoroheptylamine, and derivatives thereof,
- wherein a) ii) the reactive silicon-modified urethane compound having a functional group is prepared by reacting an isocyanate compound;
- an olefin-type unsaturated compound having at least one hydroxy group and functional group being at least one selected from the group consisting of 2-hydroxymethylmethacrylate, 2-hydroxyethylmethacrylate, 2-hydroxypropylmethacrylate, 4-hydroxyethylacrylate, and 4-hydroxybutylacrylate;
- and polydimethylsiloxane.
19 more elements
A method of preparing a polymer resin mold, comprising:
- S1) applying a fluorine-containing photocurable resin solution to one side of a mold die with a pattern formed thereon and curing it to transfer the pattern of the mold die;
- and
- S2) releasing the cured polymer resin with the pattern transferred thereto from the mold die;
- S3b) forming a plasma-treated surface on one side of a back-supporting body to be in contact with the cured polymer resin;
- and
- S4b) adhering or curing the cured polymer resin onto the plasma-treated surface which is formed on the back-supporting body to prepare a polymer resin mold,
- wherein the photocurable resin composition comprises:
- a) 100 parts by weight of a reactive pre-polymer prepared by polymerizing
- i) a reactive fluorine-containing compound having a functional group;
- and
- ii) a reactive silicon-modified urethane compound having a functional group;
- b) 5 to 100 parts by weight of at least one compound selected from the group consisting of i) an olefin-type unsaturated compound;
- ii) an unsaturated compound containing an epoxy group;
- and
- iii) a silicon-type compound containing an epoxy group, amine group or fluorine group;
- and
- c) 0.1 to 10 parts by weight of a photo initiator,
- wherein a) i) the reactive fluorine-containing compound having a functional group is at least one selected from the group consisting of 6-perfluorohexanol, 3-perfluorobutylpropanol, 2-perfluoropropyltetrafluoropropanol, 2,5-ditrifluoromethyldioxaundecafluorononanol, octafluorohexanediol, perfluorobutylepoxypropane, perfluoromethylbutylepoxypropane, tetrafluoropropoxyepoxypropane, 1,4-bisepoxypropylperfluoro-n-butane, perfluorohexylethylene, 1-methoxyperfluoromethylpropane, 1,4-divinyldodecafluorohexane, 3-perfluorobutylhydroxypropylmethacrylate, 3-perfluorohexylhydroxylpropylmethacrylate, trifluoroethylmethacrylate, tetrafluoropropylmethacrylate, 2-perfluorohexylethylacrylate, 3-perfluoromethylbutyl-2-hydroxypropylacrylate, methyltrifluoroacetate, ethyltrifluoroacetate, trifluoroethylmethylether, tetrafluoroethylmethylether, hectafluorobutylamine, tridecafluoroheptylamine, and derivatives thereof,
- wherein a) ii) the reactive silicon-modified urethane compound having a functional group is prepared by reacting an isocyanate compound;
- an olefin-type unsaturated compound having at least one hydroxy group and functional group being at least one selected from the group consisting of 2-hydroxymethylmethacrylate, 2-hydroxyethylmethacrylate, 2-hydroxypropylmethacrylate, 4-hydroxyethylacrylate, and 4-hydroxybutylacrylate;
- and polydimethylsiloxane.
18 more elements
Dependencies are inferred from the claim text.