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US 8,913,230 B2Granted
Chucking system with recessed support feature
AssigneesCanon Nanotechnologies, Inc., Molecular Imprints, Inc.
InventorsMahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
Life of this patent
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Abstract
In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
Claims19
A chucking system, comprising:
- a template chuck having a holding support section and a recessed support section, the recessed support section cincturing the holding support section, with
- the holding support section having a plurality of lands for supporting a template, the lands extending a first height from the template chuck, and
- the recessed support section having at least one recessed land for supporting a template, the recessed land extending a second height from the template chuck, wherein the second height is substantially less than the first height.
A chucking system, comprising:
- a template chuck having a back pressure zone;
- a hold zone cincturing the back pressure zone;
- and
- an outer bend zone cincturing the hold zone,
- the hold zone having a plurality of lands for supporting a template, each land extending a height from the template chuck, and the outer bend zone having a recessed land positioned on an outer boundary of the template chuck, the recessed land extending from the template chuck a height substantially less than the height of the lands in the hold zone.
2 more elements
Dependencies are inferred from the claim text.