Lithographic apparatus and device manufacturing method

A lithographic apparatus comprising:

• a projection system configured to project a pattern from a patterning device onto a substrate;
• and
• a movable object comprising a conditioning system configured to condition the object by pumping a conditioning fluid around a loop contained in the object using a pump mounted to the object,
• wherein said conditioning system is configured such that a majority of conditioning fluid in said loop is re-circulated within said loop and a minority of conditioning fluid in said loop is removed from said loop for conditioning outside of said object before being returned to said loop.

A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus comprising:

• a substrate table configured to hold a substrate;
• a moveable object comprising a conditioning system configured to condition the object, wherein said conditioning system comprises an active pressure damper and a pressure sensor for measuring the pressure of said conditioning fluid;
• and
• a controller configured to drive said active pressure damper on the basis of signals from said pressure sensor,
• wherein said active pressure damper is configured to apply a substantially equal and opposite pressure to a pressure variation measured by said pressure sensor, the pressure damper positioned in or on the substrate table or in or on a movable carrier.

A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus comprising:

• a projection system configured to project the pattern onto the substrate;
• a moveable object comprising a conditioning system configured to condition the object by propagating a conditioning fluid through said object;
• and
• two pumps and two flow restrictions in a flow path of conditioning fluid, a first of said two pumps and a first of said two restrictions for reducing a flow of the conditioning fluid in the flow path being positioned in said flow path at a position in which the conditioning fluid substantially flows towards said object, and a second of said two pumps and a second of said two restrictions for reducing the flow of the conditioning fluid in the flow path being positioned in said flow path at a position in which the conditioning fluid substantially flows away from said object.

A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus comprising:

• a projection system configured to project the pattern onto the substrate;
• a movable object;
• a conditioning system configured to hold a conditioning fluid and to condition the object;
• a conditioning fluid supply device configured to transport the conditioning fluid to the object;
• a conditioning fluid removal device configured to transport the conditioning fluid away from the object;
• a first pressure damper in fluid communication with the supply device;
• and
• a second pressure damper in fluid communication with the removal device,
• wherein the pressure dampers are arranged to dampen a pressure variation in the conditioning system and/or isolate the conditioning fluid in said object from the conditioning fluid outside of said object, the pressure dampers positioned in or on the movable object or in or on a movable carrier.

A method of manufacturing a device, the method comprising:

• projecting a patterned beam of radiation onto a target portion of a substrate;
• conditioning a movable table using a conditioning system;
• and
• dampening a pressure variation in the conditioning system using a pressure damper positioned in or on the table or in or on a movable carrier.