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US 8,913,224 B2Granted
Exposure apparatus, exposure method, and device producing method
AssigneeNixon, Inc.
InventorYoshiki Kida
Life of this patent
Estimating the term…
Abstract
An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.
Claims23
A method for liquid immersion exposure, the method comprising:
- exposing a substrate within an exposure apparatus by projecting a beam onto the substrate through an immersion liquid formed on the substrate;
- and
- measuring a property, a component, or both of the immersion liquid of the liquid immersion area formed on a surface of a sensor during a non-exposure operation.
Dependencies are inferred from the claim text.