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US 8,913,223 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsBob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
Life of this patent
Estimating the term…
Abstract
An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
Claims26
A lithographic apparatus comprising:
- a movable table;
- a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, the projection system having an optical element nearest the table;
- a liquid supply system configured to at least partly fill a space between the projection system and the table with a temperature controlled liquid, the liquid supply system comprising an outlet, between the optical element and the table, to direct a flow of the temperature controlled liquid to a localized area of an object;
- and
- a compensation controller configured to cause adjustment of an exposure parameter in response to a determined or expected temperature-induced distortion of the substrate, the table, the optical element, or any combination selected therefrom, caused at least in part by the liquid.
2 more elements
A device manufacturing method comprising:
- projecting a beam of radiation through a temperature controlled liquid onto a radiation-sensitive target portion of a substrate supported by a movable table, the projecting using an optical element, nearest the substrate, of a projection system;
- directing a flow of temperature controlled liquid to a localized area of an object using an outlet located between the optical element and the substrate;
- and
- adjusting an exposure parameter in response to a determined or expected temperature-induced distortion of the substrate, the table, the optical element, or any combination selected therefrom, caused at least in part by the liquid.
1 more element
A lithographic apparatus comprising:
- a movable table;
- a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, the projection system having an optical element nearest the table;
- a liquid supply system configured to at least partly fill a space between the projection system and the table with a liquid;
- and
- a compensation controller configured to cause adjustment of a movable object in a path of the radiation beam in response to a determined or expected temperature-induced distortion of the substrate, the table, the optical element, or any combination selected therefrom, caused at least in part by the liquid.
2 more elements
A lithographic apparatus comprising:
- a movable table;
- a projection system configured to project a radiation beam onto a radiation- sensitive target portion of a substrate;
- a liquid supply system configured to at least partly fill a space between the projection system and the table with a temperature controlled liquid;
- and
- a projection system compensator configured to adjust an optical property of the projection system based on temperature information at a plurality of locations in or on the substrate, the table, or both, the projection system compensator configured to adjust the optical property via an adjustable element arranged in the projection system.
2 more elements
A lithographic apparatus comprising:
- a movable table;
- a projection system configured to project a radiation beam onto a radiation- sensitive target portion of a substrate;
- an adjustable element arranged to adjust an optical property of the projection system;
- a liquid supply system configured to at least partly fill a space between the projection system and the table with a temperature controlled liquid;
- and
- a projection system compensator configured to adjust a property of the radiation beam based on temperature information of a component in the lithographic apparatus that is arranged to come in contact with the liquid, the projection system compensator configured to adjust the property of the radiation beam via the adjustable element.
3 more elements
Dependencies are inferred from the claim text.