Plasma treatment on semiconductor wafers
AssigneeStmicroelectronics Pte Ltd
InventorsKah Wee Gan, Yonggang Jin, Anandan Ramasamy, Yun Liu
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AssigneeStmicroelectronics Pte Ltd
InventorsKah Wee Gan, Yonggang Jin, Anandan Ramasamy, Yun Liu
Estimating the term…
A semiconductor wafer has integrated circuits formed thereon and a top passivation layer applied. The passivation layer is patterned and selectively etched to expose contact pads on each semiconductor die. The wafer is exposed to ionized gas causing the upper surface of passivation layer to roughen and to slightly roughen the upper surface of the contact pads. The wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer and a reconstituted wafer formed. Redistribution layers are formed to complete the semiconductor package having electrical contacts for establishing electrical connections external to the semiconductor package, after which the wafer is singulated to separate the dice.
A method comprising:
A device, comprising:
A method, comprising:
Dependencies are inferred from the claim text.