US 8,912,514 B2 · Target for extreme ultraviolet light source

Abstract

Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Claims20

Dependent claims

A method comprising:

directing a first amplified light beam toward a target material droplet, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the target material droplet, the pieces in the collection of pieces being spatially distributed throughout a volume that is shaped as part of a sphere and is larger than the target material droplet, the volume comprising a planar portion that extends from one edge of the volume to another and faces a direction of propagation of the second amplified light beam;
and
directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.

Dependencies are inferred from the claim text.

Target for extreme ultraviolet light source

Life of this patent

Target for extreme ultraviolet light source

Life of this patent

Abstract

Claims20