Measurement structure, method of manufacturing same, and measuring method using same
AssigneeMurata Manufacturing Co., Ltd.
InventorsTakashi Kondo, Seiji Kamba
Life of this patent
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AssigneeMurata Manufacturing Co., Ltd.
InventorsTakashi Kondo, Seiji Kamba
Estimating the term…
A measurement structure including an aperture array structure made of a metal and having a plurality of aperture portions, and a support base supporting the aperture array structure. The measurement structure is used in a measuring method by applying an electromagnetic wave to the measurement structure on which a specimen is held, detecting frequency characteristics of the electromagnetic wave transmitted through the measurement structure or reflected by the measurement structure, and measuring characteristics of the specimen. At least a first part of a surface of the aperture array structure proximal to the support base is joined to the support base, and at least a second part of the surface of the aperture array structure defines at least part of the plurality of aperture portions, the second part of the surface being proximal to the support base and not in contact with the support base.
A measurement structure comprising:
A method of manufacturing a measurement structure, the method comprising:
A measuring method comprising:
Dependencies are inferred from the claim text.