Method for preparing samples for imaging
AssigneeFEI Company
InventorsRonald Kelley, Michael Moriarty, Stacey Stone, Jeffrey Blackwood
Life of this patent
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Abstract
A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.
Claims9
A method of preparing a sample for analysis, the method comprising:
- depositing a protective layer onto the surface of the sample;
- directing an ion beam toward a work piece at a first angle and at a first beam current to remove material and expose an interior surface substantially normal to the surface of the sample below the protective layer, the exposed interior surface having irregularities;
- changing the incident angle of the beam on the sample surface;
- depositing material on the exposed interior surface, the deposited material smoothing the irregularities;
- changing the incident angle of the beam on the sample surface;
- directing an ion beam at a second beam current, less than the first beam current, toward the work piece to remove at least some of the deposited material and some material from the exposed surface to produce a smooth cross sectional face.
A method of preparing a sample for analysis, the method comprising:
- directing an ion beam toward a work piece to remove material and expose an interior surface, the exposed interior surface having irregularities resulting from the ion beam processing;
- depositing material on the exposed interior surface, the deposited material smoothing the irregularities;
- and
- directing an ion beam toward the work piece to remove at least some of the deposited material and some material from the exposed surface to produce a smooth cross sectional face;
- in which depositing material on the exposed interior surface comprises depositing material using charged particle beam deposition and further comprising re-orienting the charged particle beam relative to the sample surface before depositing so that the beam is not oriented parallel to the exposed interior surface.
Dependencies are inferred from the claim text.