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AssigneeHitachi High-Technologies Corporation
InventorsKunio Sakamoto, Megumi Aizawa, Satoshi Tomimatsu, Isamu Sekihara
Estimating the term…
Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
A charged particle beam device comprising:
A position specification method used in a charged particle beam device provided with a deflector for deflectively scanning a charged particle beam, a display unit for detecting particles generated by irradiation of the charged particle beam and displaying an image, and a controller for controlling a deflection pattern of the charged particle beam, the method comprising the steps of:
A program configured to allow a computer to execute position specification processing of a charged particle beam device provided with a deflector for deflectively scanning a charged particle beam, a display unit for detecting particles generated by irradiation of the charged particle beam and displaying an image, and a controller for controlling a deflection pattern of the charged particle beam, to perform the steps of:
Dependencies are inferred from the claim text.