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US 8,912,082 B2Granted
Implant alignment through a mask
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsNicholas P. T. Bateman, William T. Weaver, Paul Sullivan, John W. Graff
Life of this patent
Estimating the term…
Abstract
Methods to form complementary implant regions in a workpiece are disclosed. A mask may be aligned with respect to implanted or doped regions on the workpiece. The mask also may be aligned with respect to surface modifications on the workpiece, such as deposits or etched regions. A masking material also may be deposited on the implanted regions using the mask. The workpiece may be a solar cell.
Claims18
A method of manufacturing a workpiece comprising:
- applying a contact mask to a surface of a workpiece, said contact mask defining a plurality of apertures;
- implanting said workpiece with a first species through all of said apertures of said contact mask to form a plurality of first doped regions in said workpiece;
- amorphizing said workpiece during said implanting said first species to create a visual mark on said substrate;
- aligning a mask to said workpiece using said visual mark, said mask defining a plurality of apertures and being disposed a distance from said workpiece, wherein said mask is aligned so that said plurality of first doped regions cannot be seen through said apertures of said mask;
- implanting a second species through said apertures of said mask to form a plurality of second implanted regions in said workpiece;
- and
- removing said contact mask from said surface.
4 more elements
A method of manufacturing a workpiece comprising:
- disposing a first mask a distance from said workpiece, said first mask defining a plurality of apertures;
- implanting a first species through said apertures of said first mask to form a plurality of first implanted regions in said workpiece;
- modifying said surface of said first implanted regions through said apertures of said first mask, said modification creating a visual mark on said workpiece;
- aligning a second mask to said workpiece, said second mask defining a plurality of apertures and being disposed a distance from said workpiece, wherein said mask is aligned using said visual mark so that said plurality of first implanted regions cannot be seen through said apertures of said second mask;
- and
- implanting a second species through said apertures of said second mask to form a plurality of second implanted regions.
3 more elements
A method of manufacturing a workpiece comprising:
- disposing a mask a distance from said workpiece, said mask defining a plurality of apertures;
- implanting a first species through said apertures of said mask to form a plurality of first implanted regions in said workpiece;
- depositing a masking material on a surface of said first implanted regions using said apertures of said mask;
- implanting a second species to form a plurality of second implanted regions, wherein said masking material blocks a portion of said second species from implanting said first implanted regions;
- and
- removing said masking material.
3 more elements
Dependencies are inferred from the claim text.