Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern

A method of forming a pattern, comprising the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and having a cyclic structure in its molecule, and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition,

• wherein the photoacid generator (B) has a structure expressed by formula (ZI-4)
• wherein R13 represents any of a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group and a group with a cycloalkyl skeleton of a single ring or multiple rings,
• R14, each independently in the instance of R14s, represents any of an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylcarbonyl group, an alkylsulfonyl group, a cycloalkylsulfonyl group and a group with a cycloalkyl skeleton of a single ring or multiple rings,
• each of R15s independently represents an alkyl group, a cycloalkyl group or a naphthyl group, provided that the two R15s may be bonded to each other to thereby form a ring,
• 1 is an integer of 0 to 2,
• r is an integer of 0 to 8, and
• Z— represents a nonnucleophilic anion.

A method of forming a pattern, comprising the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and having a cyclic structure in its molecule, and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition,

• wherein the photoacid generator (B) has a structure expressed by formula (ZII)
• wherein each of R204 to R205 independently represents an aryl group, an alkyl group or a cycloalkyl group,
• wherein Z− is
• each of Xf independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom,
• each of R1 and R2 independently represents a member selected from among a hydrogen atom, a fluorine atom, an alkyl group and an alkyl group substituted with at least one fluorine atom, and when two or more R1s or R2s are contained, the two or more may be identical to or different from each other,
• L represents any one of a single bond, —COO—, —OCO—, and —CO—, and
• A represents an alicyclic group or a group with a nonaromatic heterocyclic structure,
• x is an integer of 1 to 20;
• y is an integer of 0 to 10 and z is an integer of 0 to 10.