Back to results
US 8,911,876 B2Granted
Method for forming patterns on substrates and articles manufactured by the same
AssigneesShenzhen Futaihong Precision Industry Co., Ltd., FIH (Hong Kong) Limited
InventorsQuan Zhou, Xin-Wu Guan, Po-Feng Ho
Life of this patent
Estimating the term…
Abstract
A method for forming pattern on substrate comprises steps of: providing a metal substrate; amorphousizing the metal substrate to from an amorphous pattern layer in the metal substrate; etching the metal substrate and forming an etching portion in the surface of the metal substrate which is not covered with the amorphous pattern layer. The article manufactured by the method is also provided.
Claims15
A method for forming pattern on substrate comprising steps of:
- providing a metal substrate;
- amorphousizing the metal substrate to from an amorphous pattern layer in the metal substrate;
- etching the metal substrate and forming an etching portion in the surface of the metal substrate not covered with the amorphous pattern layer.
An article, comprising:
- a metal substrate;
- an amorphous pattern layer formed in the metal substrate;
- and
- an etching portion formed in the metal substrate where the metal substrate is not covered with the amorphous pattern layer, the amorphous pattern layer and etching portion forming a concave-convex structure, the amorphous pattern layer having an amorphous microstructure.
1 more element
Dependencies are inferred from the claim text.