Block copolymer assembly
AssigneeSeagate Technology LLC
InventorsXiaoMin Yang, Kim Yang Lee, HongYing Wang
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Abstract
The embodiments disclose a block copolymer assembly structure, including a first pattern and second pattern with a first density of patterned features integrated in data and servo zones, a silicon substrate with thin film layers deposited thereon and patterned using the first density of first pattern and second pattern features and a template fabrication pattern with a second density greater than the first density created using ordered block copolymer periodic structures across a portion of the substrate.
Claims20
A block copolymer assembly, comprising:
- a first pattern having a first density with multi-dimensional features transferred into data zones of thin film layers that are deposited onto a silicon substrate;
- a second pattern of one-dimensional features transferred into servo zones of the thin film layers and configured to be integrated with the data zone;
- and
- a fabrication pattern with a second density greater than the first density, wherein the fabrication pattern is of ordered block copolymer periodic structures configured to be located across a portion of the silicon substrate.
A block copolymer assembly structure, comprising:
- a first pattern and second pattern with a first density of patterned features integrated in data and servo zones;
- a silicon substrate with thin film layers deposited thereon and patterned using the first density of first pattern and second pattern features;
- and
- a template fabrication pattern with a second density greater than the first density created using ordered block copolymer periodic structures across a portion of the substrate.
An assembly comprising:
- a substrate comprising a layer on a surface;
- a first pattern comprising a plurality of guiding structures formed on the layer;
- a second pattern comprising a plurality of lines formed on the layer;
- and
- a fabrication pattern comprising ordered block copolymer structures defined by the dots of the first pattern and the lines of the second pattern.
Dependencies are inferred from the claim text.