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US 8,901,019 B2Granted
Very low CTE slope doped silica-titania glass
AssigneeCorning Incorporated
InventorsSeshian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
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AssigneeCorning Incorporated
InventorsSeshian Annamalai, Carlos Alberto Duran, Kenneth Edward Hrdina
Estimating the term…
The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.
A doped silica-titania glass with an expansivity slope of less than 1 ppb/K2 at 20° C., said doped silica titania glass comprising SiO2, 3 wt. % to 10 wt. % TiO2, and a dopant selected from the group consisting of 0.1 wt. % to 5 wt. % halogens and 50 ppm-wt. to 6 wt. % oxides of at least one of Al, Nb and Ta.
A doped silica-titania glass having a ΔCTE of 5.5 ppb/K or less in the temperature range of 20° C. to 75° C. and two Tzc points in the temperature range of 20° C. to 75° C., said glass comprising SiO2, 3 wt. % to 10 wt. % TiO2 and a dopant selected from the group consisting of 0.1 wt. % to 5 wt. % fluorine and 50 ppm-wt. to 6 wt. % oxides of one or more of Al, Nb and Ta.
A method for making a doped silica-titania glass, the method comprising:
Dependencies are inferred from the claim text.