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US 8,897,419 B1Granted
Systems and methods for accelerating charged particle beams
AssigneeScience Research Laboratory, Inc.
InventorJonah H. Jacob
Life of this patent
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Abstract
Embodiments of micro-x-ray sources and methods for obtaining a micro-x-ray source are disclosed.
Claims21
An apparatus comprising:
- a first conducting structure that acts as a charged particle source of an accelerated charged particle beam;
- a second conducting structure;
- a grid disposed between the second conducting structure and the first conducting structure;
- the second conducting structure and the grid forming a capacitive structure;
- a charging component configured to charge the capacitive structure;
- a charging voltage being removed after the capacitive structure is charged;
- and
- a motion subsystem configured to effect a displacement between the second conducting structure and the grid after the charging voltage is removed:
- the displacement increasing a distance between the second conducting structure and the grid;
- a speed at which the distance is increased is selected such that the charged capacitive structure does not discharge;
- a resulting distance selected such that a predetermined increased voltage between the second conducting structure and the grid is obtained.
8 more elements
A method for obtaining an accelerated charged particle beam, the method comprising:
- charging a capacitive structure in a device comprising:
- a first conducting structure that acts as a charged particle source of the accelerated charged particle beam;
- a second conducting structure;
- a grid disposed between the second conducting structure and the first conducting structure;
- the second conducting structure and the grid forming the capacitive structure;
- a charging component configured to charge the capacitive structure;
- a charging voltage being removed after the capacitive structure is charged;
- and
- a motion subsystem configured to effect a displacement between the second conducting structure and the grid;
- removing a charging voltage after the capacitive structure is charged;
- increasing a distance between the second conducting structure and the grid after removing the charging voltage;
- a speed at which the distance is increased is selected such that the charged capacitive structure does not discharge;
- resulting displacement selected such that a predetermined increased voltage between the second conducting structure and the grid is obtained;
- and causing charged particle emission from the first conducting structure.
11 more elements
Dependencies are inferred from the claim text.