Plasmonic reflective display fabricated using anodized aluminum oxide

A method for forming a reflective plasmonic display, the method comprising:

• providing a substrate;
• prior to depositing a bottom dielectric layer, forming an electrical circuit layer with a plurality of rectangular pixels overlying the substrate;
• forming a pair of electrodes on opposite sides of each pixel;
• depositing the bottom dielectric layer overlying the electrical circuit layer in an arrangement selected from a group consisting of underlying the electrodes, overlying the electrodes, and enclosing the electrodes;
• depositing a conductive film overlying the bottom dielectric layer;
• forming a hard mask with nano-size openings overlying the conductive film;
• plasma etching the conductive film via nano-size openings in the hard mask, stopping at the dielectric layer;
• removing the hard mask, leaving a conductive film with nano-size openings to the dielectric layer;
• depositing metal in the nano-size openings, creating a pattern of metallic nanoparticles overlying the dielectric layer;
• and,
• removing the conductive film.

A method for forming a reflective plasmonic display, the method comprising:

• providing a substrate;
• prior to depositing a bottom dielectric layer, forming an electrical circuit layer with a plurality of pixels overlying the substrate;
• forming a bottom electrode overlying each pixel;
• depositing the bottom dielectric layer overlying the plurality of bottom electrodes;
• depositing a conductive film overlying the bottom dielectric layer;
• forming a hard mask with nano-size openings overlying the conductive film;
• plasma etching the conductive film via nano-size openings in the hard mask, stopping at the dielectric layer;
• removing the hard mask, leaving a conductive film with nano-size openings to the dielectric layer;
• depositing metal in the nano-size openings, creating a pattern of metallic nanoparticles overlying the dielectric layer;
• and,
• removing the conductive film.