Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorHeine Melle Mulder
Life of this patent
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Abstract
A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
Claims20
An exposure apparatus, comprising:
- a projection system configured to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams comprises a first group of radiation beams formed from radiation within a first wavelength range and a second group of radiation beams formed from radiation within a second wavelength range, different from the first wavelength range;
- and
- a dispersion element, configured such that radiation beams of the first group are incident on the dispersion element at a different angle from radiation beams of the second group and such that the radiation beams of the first and second groups output from the dispersion element are substantially parallel, wherein the radiation beams within each group incident on the dispersion element are arranged in a respective row associated with each group when incident on the dispersion element, and the radiation beams of the first and second groups output from the dispersion element are arranged in a single row when output from the dispersion element.
A device manufacturing method comprising:
- using a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams comprises a first group of radiation beams formed from radiation within a first wavelength range and a second group of radiation beams formed from radiation within a second wavelength range, different from the first wavelength range;
- and
- passing the radiation beams via a dispersion element such that radiation beams of the first group are incident on the dispersion element at a different angle from radiation beams of the second group and such that the radiation beams of the first and second groups output from the dispersion element are substantially parallel, wherein the radiation beams within each group incident on the dispersion element are arranged in a respective row associated with each group when incident on the dispersion element, and the radiation beams of the first and second groups output from the dispersion element are arranged in a single row when output from the dispersion element.
An exposure apparatus, comprising:
- a projection system configured to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams comprises a first group of radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range;
- and
- a dispersion element, configured such that radiation beams of the first group are incident on the dispersion element at a different angle, from one or more radiation beams of the second group and such that the radiation beams of the first and second groups output from the dispersion element are substantially parallel in a single row and output from the dispersion element at a different angle than the angles of incidence on the dispersion element of the radiation beams of the first group and of the one or more radiation beams of the second group.
Dependencies are inferred from the claim text.