Nonvolatile storage device
AssigneeKabushiki Kaisha Toshiba
InventorsShigeki Kobayashi, Kazuhiko Yamamoto, Kenji Aoyama, Shigeto Oshino, Kei Watanabe, Shinichi Nakao, Satoshi Ishikawa, Takeshi Yamaguchi
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AssigneeKabushiki Kaisha Toshiba
InventorsShigeki Kobayashi, Kazuhiko Yamamoto, Kenji Aoyama, Shigeto Oshino, Kei Watanabe, Shinichi Nakao, Satoshi Ishikawa, Takeshi Yamaguchi
Estimating the term…
A nonvolatile storage device is formed by laminating a plurality of memory cell arrays, the memory cell array including a plurality of word lines, a plurality of bit lines, and memory cells. The memory cell includes a current rectifying device and a variable resistance device, the variable resistance device includes a lower electrode, an upper electrode, and a resistance change layer including a conductive nano material formed between the lower electrode and the upper electrode, one of the variable resistance devices provided adjacent to each other in the laminating direction has titanium oxide (TiOx) between the resistance change layer and the lower electrode serving as a cathode, the other of the variable resistance devices provided adjacent to each other in the laminating direction has titanium oxide (TiOx) between the resistance change layer and the upper electrode serving as a cathode.
A nonvolatile storage device comprising a resistance change device including:
Dependencies are inferred from the claim text.