Lithography system and method of processing substrates in such a lithography system
AssigneeMapper Lithography IP B.V.
InventorsGuido De Boer, Hendrik Jan De Jong, Vincent Sylvester Kuiper, Erwin Slot
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Abstract
The invention relates to a lithography system comprising a plurality of lithography system units. Each lithography system unit comprises a lithography apparatus arranged in a vacuum chamber for patterning a substrate; a load lock system for transferring substrates into and out of the vacuum chamber; and a door for enabling entry into the vacuum chamber for servicing purposes. The load lock system and the door of each lithography system unit are provided at the same side and face a free area at a side of the lithography system, in particular the service area.
Claims28
A lithography system comprising a plurality of lithography system units, each lithography system unit comprising:
- a vacuum chamber;
- a lithography apparatus arranged in the vacuum chamber for patterning a substrate;
- a load lock system for transferring substrates into and out of the vacuum chamber;
- and
- a door for enabling entry into the vacuum chamber for servicing purposes;
- wherein the load lock system and the door of each lithography system unit are provided at the same side of the lithography system unit and face a free area at a side of the lithography system.
A lithography system unit comprising:
- a vacuum chamber;
- a lithography apparatus arranged in the vacuum chamber for patterning a substrate;
- and
- a door for enabling entry into the vacuum chamber for servicing purposes;
- wherein the door of the lithography system unit faces a free area at a side of the lithography system unit, and
- wherein the door is provided with one or more components for handling the substrate.
Dependencies are inferred from the claim text.