Acid-labile polymers and monomers for their construction
AssigneeThe Research Foundation of State University of New York
InventorsRobert L. Brainard, Brian Cardineau
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Abstract
Polymers for photoresists and monomers for incorporation into those polymers are disclosed. The polymers comprise at least two components: an acid labile component and a photolytically stable and acid-stable component. The polymers may also contain a third, photoacid generator (PAG) component. The acid-labile component is based on the presence of a readily cleavable oxygen-carbon bond that usually occurs in a sterically hindered ether or ester.
Claims9
A polymer comprising a first component and a second component, said first component being photolytically stable and acid-stable, wherein said first component is —CO-G5-CO—, wherein G5 is selected from an alkane, a fluoroalkane, an arene, a fluoroarene, a diaryl ether and a diaryl;
- and said second component consisting of a unit chosen from units of the formulae
- wherein
- R3 and R4 are independently chosen from (C1-C6)alkyl, or R3 and R4 together with the carbon to which they are attached form a cyclopentane or cyclohexane ring;
- G1 is selected from (C1-C20)hydrocarbon and fluoro(C1-C20)hydrocarbon;
- G2 is an unsaturated (C2-C10)hydrocarbon;
- and
- A1 and A2 are independently chosen from (C1-C20)hydrocarbon, fluoro(C1-C20)hydrocarbon, (C1-C20)hydrocarbon ether, (C1-C6)oxaalkyl, (C1-C6)thiaalkyl, (C1-C6)azaalkyl and acylated(C1-C6)azaalkyl, each of the foregoing terminating in —O—, —S— or —NR9—, wherein R9 is H, (C1-C6)alkyl or benzyl.
Dependencies are inferred from the claim text.