Method for forming pattern and method for manufacturing display device by using the same

A method for forming a pattern, comprising:

• forming a photoresist on a substrate;
• first exposing the photoresist by using a first photomask where an interval ratio of a light shielding part to a light transmission part is from 2:1 to 4:1;
• second exposing the first exposed photoresist by using a second photomask that has comprising a light shielding part and a light transmission part at a position that is horizontally shifted from the position of the light shielding part and the light transmission part of the first photomask, and where an interval ratio of the light shielding part to the light transmission part is from 2:1 to 4:1;
• and
• developing the second exposed photoresist.

A method for forming a display device, comprising:

• forming a conductive layer on a substrate;
• forming a photoresist on a conductive layer;
• performing a first exposure of the photoresist by using a photomask where an interval ratio of a light shielding part to a light transmission part is from 2:1 to 4:1;
• performing a second exposure of the first exposed photoresist after the photomask is horizontally shifted an interval, or performing a second exposure of the first exposed photoresist by using a second photomask comprising a light shielding part and a light transmission part at a position that is horizontally shifted from the position of the light shielding part and the light transmission part of the first photomask, and where an interval ratio of the light shielding part to the light transmission part is from 2:1 to 4:1;
• developing the second exposed photoresist;
• and
• forming a conductive layer pattern by etching the conductive layer by using the developed photoresist as an etching mask.