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US 8,895,233 B2Granted
Three-dimensional direct-write lithography
AssigneeThe Regents of the University of Colorado, a body corporate
InventorRobert R. McLeod
Life of this patent
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Abstract
A method of creating a region of index change in a photopolymer includes providing a photopolymer having a photosensitivity to light of a particular wavelength and creating a region of index change in the photopolymer by applying direct write lithography to expose the photopolymer of the region to light that includes the particular wavelength.
Claims11
A method of creating a smooth region of index change in a photopolymer, comprising:
- providing a photopolymer having a photosensitivity to light of a particular wavelength;
- generating, using a continuous wave light source, a writing beam that includes the particular wavelength;
- translating the writing beam in each of three dimensions while adjusting a shape, power, or exposure time of the writing beam based on interactions between the photopolymer and the writing beam to create patterns having a smooth refractive index change and a uniform cross section in the photopolymer in response to a time integral of an intensity of the writing beam.
Dependencies are inferred from the claim text.