Patterning process and resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Kazuhiro Katayama
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Abstract
A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator having both a 9-fluorenylmethyloxycarbonyl-substituted amino group and a carboxyl group onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising an alcohol and an optional ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern.
Claims17
A process for forming a pattern, comprising the steps of:
- coating a first positive resist composition comprising a copolymer comprising recurring units having lactone as an adhesive group and recurring units having an acid labile group, a photoacid generator, a base generator, and a first solvent comprising at least one of PGMEA and cyclohexanone onto a substrate to form a first resist film, exposing the first resist film to high-energy radiation, post-exposure baking, and developing the first resist film with a developer to form a first resist pattern,
- heating the first resist pattern at 100 to 140° C. for 3 to 180 seconds for causing the base generator to generate an amine compound for inactivating the first resist pattern to acid while the first resist pattern remains soluble in the first solvent,
- coating a second positive resist composition comprising a second solvent which contains an alcohol of 3 to 8 carbon atoms and an optional ether of 6 to 12 carbon atoms, which does not dissolve away the first resist pattern, and which is different from the first solvent onto the first resist pattern-bearing substrate to form a second resist film, exposing the second resist film to high-energy radiation, post-exposure baking, and developing the second resist film with a developer to form a second resist pattern,
- wherein said base generator has the general formula (1′) or (2′):
- wherein R is a straight, branched or cyclic C1-C8 alkylene group, a straight or branched C2-C8 alkenylene or C7-C14 aralkylene group, a C6-C12 arylene group, or a straight, branched or cyclic C1-C6 alkylene group having a halo- or C1-C6 alkoxy-substituted aryl group bonded thereto, which may be separated by a —COO—, —CONH— or —NHCO— group, and
- R′ is a trivalent group derived by eliminating one hydrogen atom from a straight, branched or cyclic C1-C8 alkylene group.
A chemically amplified positive resist composition comprising a copolymer comprising recurring units having lactone as an adhesive group and recurring units having an acid labile group, a photoacid generator, a base generator, and an organic solvent,
- said base generator having the general formula (1) or (2):
- wherein R1, R2, R3, and R5 are each independently hydrogen, a straight, branched or cyclic C1-C20 alkyl group, or a C4-C14 aromatic or hetero-aromatic group, the alkyl group may have a double bond, triple bond, aromatic group, hetero-aromatic group, ether group, sulfide group, carbonyl group, ester group, hydroxyl group, amino group, amide group, lactone ring, maleimide group, sulfone or halogen atom, the aromatic or hetero-aromatic group may have a straight, branched or cyclic C1-C6 alkyl or alkoxy group, nitro group, halogen atom, cyano group, trifluoromethyl group, carbonyl group, ester group, lactone ring, carbonate group, maleimide group, amide group or sulfone, a pair of R1 and R2, R3 and R5, R3 and R4, and R4 and R5 may bond together to form a ring with the nitrogen atom to which they are attached,
- R4 is a single bond, or a straight, branched or cyclic C1-C20 alkylene group, C6-C20 arylene group, C2-C12 alkenylene group, or C2-C12 alkynylene group, which may have an ether, sulfide, amino, carbonyl, hydroxyl or ester group,
- either one or each of R1 and R2 has at least one carboxyl group, and at least one of R3, R4, and R5 has at least one carboxyl group.
Dependencies are inferred from the claim text.