Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method

A coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the composition comprising:

• 100 parts by weight of a solvent including a first solvent;
• and
• about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to DUV incident light, and
• wherein the first solvent is an alcohol-based solvent including at least one organic compound selected from the group consisting of methanol, ethanol, 1-propaneol, isopropaneol, n-propaneol, n-butanol, 2-butanol, tert-butanol, 1-pentanol, 2-pentanol, 3-pentanol, n-hexanol, cyclohexanol, 2-methyl-2-butanol, 3-methyl-2-butanol, 2-methyl-1-butanol, 3-methyl-1-butanol, 2-methyl-1-pentanol, 2-methyl-2-pentanol, 2-methyl-3-pentanol, 3-methyl-1-pentanol, 3-methyl-2-pentanol, 3-methyl-3-pentanol, 4-methyl-1-pentanol, 4-methyl-2-pentanol, 2,2-dimethyl-3-pentanol, 2,3-dimethyl-3-pentanol, 2,4-dimethyl-3-pentanol, 4,4-dimethyl-2-pentanol, 3-ethyl-3-pentanol, 1-heptanol, 2-heptanol, 3-heptanol, 2-methyl-2-hexanol, 2-methyl-3-hexanol, 5-methyl-1-hexanol, 5-methyl-2-hexanol, 2-ethyl-1-hexanol, 4-methyl-3-heptanol, 6-methyl-2-heptanol, 1-octanol, 2-octanol, 3-octanol, 2-propyl-1-pentanol, 2,4,4-trimethyl-1-pentanol, 2,6-dimethyl-4-heptanol, 3-ethyl-2,2-dimethyl-pentanol, 1-nonanol, 2-nonanol, 3,5,5-trimethyl-1-hexanol, 1-decanol, 2-decanol, 4-decanol, 3,7-dimethyl-1-octanol, and 3,7-dimethyl-3-octanol.

A coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the composition comprising:

• 100 parts by weight of a solvent including a first solvent, the first solvent being an alcohol-based solvent;
• and
• about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to DUV incident light, and
• wherein the coating polymer has a solubility with respect to the first solvent that is about 10 times greater than that of a (meth)acrylate-based resin with respect to the first solvent.