Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid upon irradiation with an actinic ray or radiation,
• wherein
• a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group,
• provided that an anionic moiety of the ionic structure moiety is bonded to a main chain of the resin (P) via covalent bond, and the cationic moiety is free as a counter cation;
• wherein the repeating unit (A) is a repeating unit represented by any one of the following formulas (III) to (V):
• wherein in formulas (III) to (V), each of R04, R05 and R07 to R09 independently represents a hydrogen atom, a substituted or unsubstituted alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group;
• R06 represents a cyano group, a carboxyl group, —CO—OR25 or —CO—N(R26)(R27), provided that R26 and R27 may combine to form a ring together with the nitrogen atom;
• each of X1 to X3 comprises an arylene group;
• R25 represents an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group;
• each of R26, R27 and R33 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group, and
• A represents the ionic structure moiety which produces an acid upon irradiation with an actinic ray or radiation and in which the counter cation is a cation having an acid-decomposable group or an alkali-decomposable group, and
• the repeating unit (A) contains a repeating unit represented by formula (III), and an acid generated from the repeating unit represented by formula (III) has an acid anion represented by the following formula:
• wherein R01 represents a hydrogen atom, a methyl group, a chloromethyl group, a trifluoromethyl group or a cyano group;
• Ar1 a represents an arylene group which may have a substituent;
• and
• R02 represents an arylene group, an alkylene group, a cycloalkylene group, —O—, —SO2—, —CO—, —N(R33)— or a divalent linking group formed by combining a plurality of these groups,
• R33 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group or an aralkyl group.