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US 8,894,872 B2Granted
Etching compositions, methods and printing components
AssigneeDip-Tech Ltd.
InventorsMatti Ben-Moshe, Michael Kheyfets
Life of this patent
Estimating the term…
Abstract
A liquid etching composition comprising: (a) at least one etching agent precursor having an activation temperature of at least 400° C., at which temperature said precursor yields an active agent suitable for chemical etching of glass, said precursor present at a concentration of at least 2.5% w/w; (b) a binder; and (c) a liquid vehicle.
Claims21
A liquid etching composition for inkjet printing comprising:
- (a) at least one non-active etching agent precursor, which is inactive with respect to chemically etching glass, the precursor comprising at least one alkali metal salt having an activation temperature of at least 400° C., wherein when heating the composition to the activation temperature, said precursor yields an active etching agent suitable for chemical etching of glass, said precursor present at a concentration of at least 2.5% w/w;
- (b) a binder comprising silica nanoparticles;
- and
- (c) a liquid vehicle,
- wherein the liquid etching composition is for inkjet printing.
2 more elements
A liquid etching composition for inkjet printing comprising:
- (a) at least 2.5% w/w of a non-active etching agent precursor, which is inactive with respect to chemically etching glass, the precursor having an activation temperature of at least 400° C., wherein when heating the composition to the activation temperature, the non-active precursor yields an active etching agent suitable for chemical etching of glass;
- (b) a binder;
- (c) a liquid vehicle;
- and
- (d) an additive which decreases the temperature at which the non-active etching agent precursor yields the active etching agent,
- wherein the liquid etching composition is for inkjet printing.
3 more elements
An etching method comprising:
- (a) inkjet printing a liquid etching composition comprising at least one agent precursor, at a concentration of at least 2.5% w/w, onto a glass surface to form a pattern, wherein the precursor is inactive with respect of chemically etching glass;
- and
- (b) firing said surface at a temperature above the 400° C. so that the precursor undergoes activation to yield an active agent which chemically etches the pattern on the glass surface.
Dependencies are inferred from the claim text.