Multi-step method and apparatus for etching compounds containing a metal
AssigneeASM IP Holding B.V.
InventorsJereld Lee Winkler, Eric James Shero, Fred Alokozai
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Abstract
A system and method for etching a material, including a compound having a formulation of XYZ, wherein X and Y are one or more metals and Z is selected from one or more Group 13-16 elements, such as carbon, nitrogen, boron, silicon, sulfur, selenium, and tellurium, are disclosed. The method includes a first etch process to form one or more first volatile compounds and a metal-depleted layer and a second etch process to remove at least a portion of the metal-depleted layer.
Claims20
A method of etching material, the method comprising the steps of:
- in a reaction chamber, exposing a material comprising a formula XYZ, wherein X comprises a metal selected from the group consisting of Group 13-16 metals and transition metals, Y comprises a metal selected from the group consisting of Group 13-16 metals and transition metals, and Z is selected from one or more Group 13-16 elements, to a first etch chemistry to form one or more first volatile compounds and a metal-depleted material;
- removing the one or more first volatile compounds from the reaction chamber;
- exposing the metal-depleted material to a second etch chemistry to react with the metal-depleted material to form one or more second volatile compounds;
- and
- removing the one or more second volatile compound.
A method of etching material, the method comprising the steps of:
- in a reaction chamber, exposing a material comprising a formula XYZ, wherein X comprises a metal selected from the group consisting of Group 13-16 metals and transition metals, Y comprises a metal selected from the group consisting of Group 13-16 metals and transition metals, and Z is selected from one or more Group 13-16 elements, to a first etch chemistry to form one or more first volatile compounds and a metal-depleted material;
- removing the one or more first volatile compounds from the reaction chamber;
- repeating the exposing a material comprising a formula XYZ and the removing the one or more first volatile compounds steps;
- exposing the metal-depleted material to a second etch chemistry to react with the metal-depleted material to form one or more second volatile compounds;
- and
- removing the one or more second volatile compounds.
Dependencies are inferred from the claim text.