Sputtering target, method for manufacturing the same, manufacturing semiconductor device
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorShunpei Yamazaki
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Abstract
A deposition technique for forming an oxynitride film is provided. A highly reliable semiconductor element is manufactured with the use of the oxynitride film. The oxynitride film is formed with the use of a sputtering target including an oxynitride containing indium, gallium, and zinc, which is obtained by sintering a mixture of at least one of indium nitride, gallium nitride, and zinc nitride as a raw material and at least one of indium oxide, gallium oxide, and zinc oxide in a nitrogen atmosphere. In this manner, the oxynitride film can contain nitrogen at a necessary concentration. The oxynitride film can be used for a gate, a source electrode, a drain electrode, or the like of a transistor.
Claims16
A method for manufacturing a sputtering target including an oxynitride comprising indium, gallium, and zinc, the method comprising the steps of:
- mixing at least one of indium nitride, gallium nitride, and zinc nitride and at least one of indium oxide, gallium oxide, and zinc oxide as a mixture;
- and
- sintering the mixture in a gas atmosphere comprising nitrogen.
A method for manufacturing a sputtering target, comprising the steps of:
- preparing a first material and a second material each comprising at least one of indium, gallium, and zinc;
- oxidizing the first material in an oxygen atmosphere to form an oxide material;
- nitriding the second material in a nitrogen atmosphere to form a nitride material;
- mixing the oxide material and the nitride material to form a mixture;
- and
- sintering the mixture to form a sintered body of an oxynitride,
- wherein each of the first material and the second material is in a powder form,
- wherein the oxide material comprises at least one of indium oxide, gallium oxide, and zinc oxide, and
- wherein the nitride material comprises at least one of indium nitride, gallium nitride, and zinc nitride.
Dependencies are inferred from the claim text.