Process for production of polycrystalline silicon
AssigneeWacker Chemie AG
InventorsMarcus Schaefer, Oliver Kraetzschmar
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Abstract
The invention provides a process for producing polycrystalline silicon, including introduction of a reaction gas containing a silicon-containing component and hydrogen by means of one or more nozzles into a reactor including at least one heated filament rod on which silicon is deposited, wherein an Archimedes number Arn which describes flow conditions in the reactor, as a function of the fill level FL which states the ratio of one rod volume to one empty reactor volume in percent, for a fill level FL of up to 5% is within the range limited at the lower end by the function Ar=2000×FL−0.6 and at the upper end by the function Ar=17 000×FL−0.9, and at a fill level of greater than 5% is within a range from at least 750 to at most 4000.
Claims10
A process for producing polycrystalline silicon, comprising introduction of a reaction gas comprising a silicon-containing component and hydrogen through one or more nozzles into a reactor comprising at least one heated filament rod on which silicon is deposited, wherein an Archimedes number Arn, which describes flow conditions in the reactor as a function of a fill level FL which states a ratio of a rod volume to an empty reactor volume in percent, for a fill level FL of up to 5% is within a range limited at a lower end by a function Ar=2000×FL−0.6 and at an upper end by a function Ar=17000×FL−0.9, and at a fill level of greater than 5% is within a range from at least 750 to at most 4000.
Dependencies are inferred from the claim text.