US 8,894,686 B2Granted

Interspinous process implants and methods of use

AssigneeWarsaw Orthopedic, Inc.

InventorsJames F. Zucherman, Ken Y. Hsu, Charles J. Winslow, Scott A. Yerby, John J. Flynn, Steven T. Mitchell, John A. Markwart

Life of this patent

Estimating the term…

patentgrep

Loading patent…

Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

Claims32

Dependent claims

An apparatus, comprising:

a first implant member having a central portion, a proximal end and a distal end, wherein the central portion is configured to be disposed between a first spinous process and a second spinous process, the proximal end comprising a proximal end portion extending outwardly from the central portion, the central portion comprising a spiral portion that extends outwardly from a periphery of the central portion and is spaced apart from the proximal end portion;
and
a second implant member having a first portion and a second portion having inner surfaces that abut an outer surface of the first implant member and conform with a shape of the first implant member, the second portion having a maximum length that is greater than that of the first portion, the second implant member being coupled to the first implant member after the central portion is disposed between the first spinous process and the second spinous process, the first portion being configured to be disposed between the central portion and the first spinous process, the second portion being configured to be disposed between the central portion and the second spinous process, the second implant member being received over the first implant member in a direction substantially parallel to a longitudinal axis of the first implant member so as to be coupled to the first implant member after at least a portion of the first implant member is disposed between a pair of adjacent spinous processes;
wherein when the second implant member is coupled to the first implant member, the first and second portions each extend through slots in the proximal end portion and end surfaces of the first and second portions each engage an outer surface of the spiraled portion.

1 more element

An apparatus, comprising:

an implant extending along a longitudinal axis and having first and second wings that are spaced apart from one another along the longitudinal axis, the first wing having two slots extending therethrough that are spaced apart from one another;
and
a spacer having a central portion having a top portion and a bottom portion that are spaced apart from one another by a gap, the bottom portion having a maximum length that is greater than that of the to portion, the top and bottom portions having inner surfaces that abut an outer surface of the implant and conform with a shape of the implant, the central portion of the spacer being received over the implant such that the top portion extends through one of the slots, the bottom portion extends through the other slot in a direction substantially parallel to the longitudinal axis and end surfaces of the to and bottom portions engage an outer surface of the second wing so as to couple the spacer to the implant after at least a portion of the implant is disposed between a pair of adjacent spinous processes;
wherein when the central portion of the spacer extends through the slot, the central portion of the spacer is disposed outside of the portion of the implant;
the central portion of the spacer configured to define a space between the pair of adjacent spinous processes.

2 more elements

An apparatus, comprising:

a first implant member defining a first longitudinal axis and having a distal retention member configured to limit lateral movement of the first implant member relative to a pair of adjacent spinous processes and a proximal retention member, an outer surface of the first implant member being free of threads between the distal and proximal retention members, the distal retention member includes two slots that are spaced apart from one another and extend parallel to the first longitudinal axis;
and
a second implant member defining a second longitudinal axis and having a top portion and a bottom portion, the bottom portion has a maximum length that is greater than that of the to portion, the top and bottom portions having unthreaded inner surfaces that abut the outer surface of the first implant member and conform with a shape of the first implant member, the second implant member includes having a distraction portion configured to be disposed between the spinous processes and proximally to at least a portion of the distal retention member of the first implant member when the second implant member is coupled to the first implant member such that the top portion extends through one of the slots, the bottom portion extends through the other slot and the first implant member is disposed between the pair of adjacent spinous processes, the distraction portion being configured to distract a space between the pair of adjacent spinous processes, the second implant member being received over the first implant member in a direction substantially parallel to the first longitudinal axis such that end surfaces of the top and bottom portions engage the proximal retention member so as to couple the second implant member to the first implant member after at least a portion of the first implant member is disposed between a pair of adjacent spinous processes;
the first and second axes being substantially parallel;
wherein, when the second implant member is coupled to the first implant member;
the second implant member overlies the outer surface of the first implant member;
and
a height of the apparatus, where the second implant member overlies the first implant member, is increased in a direction transverse to the longitudinal axes.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application: 11/771,087Filed 29 Jun 2007 · continuation
Priority: 29 Oct 2002
Published: US 2008/0021468 A114 Feb 2008
Granted: 25 Nov 2014
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

A61B 17/7053
Spinal positioners or stabilisers, e.g. stabilisers comprising fluid filler in an implant: with parts attached to bones or to each other by…
A61B 17/7062
Spinal positioners or stabilisers, e.g. stabilisers comprising fluid filler in an implant: devices acting on, attached to, or simulating the…
A61B 17/7065
Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs ; Tools for such devices: devices with…
A61B 17/7068
Devices acting on, attached to, or simulating the effect of, vertebral processes, vertebral facets or ribs ; Tools for such devices: devices…

Family

Application60/421,915Us provisional application · filed 29 Oct 2002
Application60/472,817Us provisional application · filed 22 May 2003
Application10/694,103Parent of this continuation-in-part · filed 27 Oct 2003
Application10/816,173Parent of this continuation-in-part · filed 1 Apr 2004
Application10/850,267Parent of this continuation-in-part · filed 20 May 2004
Application60/612,582Us provisional application · filed 23 Sep 2004
Application60/612,465Us provisional application · filed 23 Sep 2004
Application60/663,918Us provisional application · filed 21 Mar 2005
Application60/663,885Us provisional application · filed 21 Mar 2005
Application60/663,922Us provisional application · filed 21 Mar 2005
Application60/664,311Us provisional application · filed 22 Mar 2005
Application60/664,049Us provisional application · filed 22 Mar 2005
Application60/664,076Us provisional application · filed 22 Mar 2005
Application11/095,440Parent of this continuation-in-part · filed 31 Mar 2005
Application11/095,680Parent of this continuation-in-part · filed 31 Mar 2005
Application60/672,402Us provisional application · filed 18 Apr 2005
Application11/234,555Parent of this continuation-in-part · filed 23 Sep 2005
Application11/378,893Parent of this continuation-in-part · filed 17 Mar 2006
Application11/384,055Parent of this continuation-in-part · filed 17 Mar 2006
Application11/378,108Parent of this continuation-in-part · filed 17 Mar 2006
Application11/377,971Parent of this continuation-in-part · filed 17 Mar 2006
Application11/378,894Parent of this continuation-in-part · filed 17 Mar 2006
Application11/378,892Parent of this continuation-in-part · filed 17 Mar 2006
Application11/389,002Parent of this continuation-in-part · filed 24 Mar 2006
Application11/806,528Parent of this continuation · filed 31 May 2007
Application11/806,526Parent of this continuation · filed 31 May 2007
US 2008/0039947 A1Pre-grant publication · published 14 Feb 2008
US 8,221,463 B2Parent of this continuation
Application11/806,528Parent of this continuation-in-part
US 8,048,117 B2Parent of this continuation-in-part
US 7,695,513 B2Parent of this continuation-in-part
US 8,070,778 B2Parent of this continuation-in-part
Application10/806,528Parent of this continuation-in-part
US 7,549,999 B2Parent of this continuation-in-part
US 7,909,853 B2Parent of this continuation-in-part
US 7,749,252 B2Parent of this continuation-in-part
US 7,931,674 B2Parent of this continuation-in-part
US 7,959,652 B2Parent of this continuation-in-part
US 8,147,548 B2Parent of this continuation-in-part
Application11/806,526Parent of this continuation-in-part
US 7,659,513 B2Parent of this continuation-in-part
US 2005/0010293 A1Published application
US 2005/0010298 A1Published application
US 2005/0075634 A1Published application
US 2005/0210973 A1Published application
US 2006/0064165 A1Published application
US 2006/0064166 A1Published application
US 2006/0089718 A1Published application
US 2006/0264938 A1Published application
US 2006/0264939 A1Published application
US 2006/0265066 A1Published application
US 2006/0265067 A1Published application
US 2006/0271049 A1Published application
US 2006/0271194 A1Published application
US 2007/0010813 A1Published application
US 2008/0021468 A1Published application
US 2008/0027545 A1Published application
US 7,000,461 B2Related patent
US 8,894,686 B2This patent

From the US filing history. Foreign family members aren’t listed.