Film exposure method
AssigneeV Technology Co., Ltd.
InventorsToshinari Arai, Kazushige Hashimoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeV Technology Co., Ltd.
InventorsToshinari Arai, Kazushige Hashimoto
Estimating the term…
On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored ink is applied to at least one of two widthwise side edges to form a side part application coating, which is irradiated with laser light by an alignment mark formation unit to form an alignment mark. The alignment mark is then used to detect film meandering and adjust the positions of masks. This makes it easy to form the alignment mark and detect the alignment mark thus formed and makes it possible to accurately correct for meandering of a film and stably expose the film in the process of continuous exposure of a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material.
A film exposure method in which an exposure material coating, which is formed in an exposure pattern formation region on a film base material of a film, is irradiated with an exposure light via a mask, whereby a pattern of said mask is exposed on said exposure material coating,
Dependencies are inferred from the claim text.